GaAs pseudomorphic high-electron-mobility transistors (pHEMTs) are widely employed in radio-frequency (RF) and microwave front-end circuits owing to their high electron mobility and excellent ...
For the continuation in scaling of the complementary metal oxide semiconductor (CMOS) technology at the sub-5 nm technology node, FinFET-based logic devices are competing against the gate-all-around ...
A new technical paper, “Gate-Drain Leakage Enhanced by Drain-Induced Dielectric Barrier Lowering in Gate-All-Around Field Effect Transistors,” was published by researchers at Sandia National ...
A new technical paper titled “Electrical Characteristics of ML and BL MoS2 GAA NS FETs With Source/Drain Metal Contacts” was published by researchers at National Yang Ming Chiao Tung University. “This ...