Defect inspection scientists from Huazhong University of Science and Technology, Harbin Institute of Technology and The Chinese University of Hong Kong make a thorough review of new perspectives and ...

MILPITAS, Calif., July 8, 2019 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced the 392x and 295x optical defect inspection systems and the eDR7380™ e-beam defect review system. The new ...

TOKYO — During the Semicon Japan trade show here today, nLine Corp. rolled out its first product–a wafer inspection tool, based on a new and radical holographic imaging technology. The new ...

Wafers can be inspected for large, obvious defects, or for small, subtle ones. The former is referred to as macro-inspection, while the latter is micro-inspection. These processes use different ...

Electric vehicles, fast-charging infrastructure, renewable energy systems, and industrial power conversion are redefining what power semiconductors need to deliver: higher voltages, higher power ...

MILPITAS, Calif., July 20, 2020 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced the revolutionary eSL10™ e-beam patterned-wafer defect inspection system. The new system is designed to ...

“Wafer mass metrology has become increasingly important as semiconductor processes have become more complex and sensitive,” said Microtronic CEO Reiner Fenske in making the announcement. “Today’s fabs ...

MILPITAS, Calif.--(BUSINESS WIRE)--Today KLA-Tencor Corporation (NASDAQ:KLAC), the world’s leading supplier of process control and yield management solutions for the semiconductor and related ...

Wafers produced for products as diverse as LEDs and MP3 players vary greatly in function, but they have one thing in common: They often undergo optical inspection after they pass an electrical test.

Following its acquisition of Candela Instruments, KLA-Tencor has introduced the Candela CS20, an automated wafer inspection system designed to address the defect management requirements of ...

As semiconductor manufacturers aim to produce devices at the 5-nanometer node, the ability to find tiny defects created inadvertently during the fabrication process becomes harder. In addition, there ...